Browsing Institute of Nano Electronic Engineering (INEE) (Articles) by Subject "Critical dimension"
Now showing items 1-5 of 5
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Conventional photolithography and process optimization of pattern- size expansion technique for nanogap biosensor fabrication
(Trans Tech Publications, 2014)For a submicron photolithography process, there is little room for error. In this paper, an optimized technique for photoresist (PR) development is reported, to fabricate a nanogap biosensor for application in biomedical ... -
Mask design and fabrication of Micro/Nanowire biochip for reliable and repeatability pattern transfer
(Trans Tech Publications, 2014)In Micro/Nanowire fabrication, the alignment and exposure process are the most critical steps in photolithography process, and indeed for the whole biochip processing. This process determines the success of transferring ... -
Microfluidic photomask design using CAD software for application in lab-on-chip biomedical nano diagnostics
(Trans Tech Publications, 2013)Photomasks are used as stencil to print images on semiconductor material. This study represents design and specifications of photomask for microfluidic fabrication. For a precise pattern transfer, the photomask should meet ... -
Nanoelectrode chrome photomask design and specification for biosensor fabrication
(Trans Tech Publications, 2013)This paper explains the most crucial part of any microchip fabrication, which is the mask design for photolithography process. The design is initially sketched roughly to meet the design specification and later on designed ... -
Resist uniformity evaluation through swing curve phenomena
(INSInet Publications, 2012)In fabrication of Micro/ Nano structure, alignment and exposure are the most critical steps in photolithography process, the resolution requirements and precise alignment are vital; each mask needs to be precisely aligned ...