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dc.contributor.authorUda, Hashim
dc.contributor.authorSiti Fatimah, Abd Rahman
dc.contributor.authorMohammad Nuzaihan, Md Nor
dc.contributor.authorShahrir, Salleh
dc.date.accessioned2009-12-06T02:09:25Z
dc.date.available2009-12-06T02:09:25Z
dc.date.issued2008-12-01
dc.identifier.citationp.1-6en_US
dc.identifier.isbn978-1-4244-2315-6
dc.identifier.urihttp://ieeexplore.ieee.org/xpls/abs_all.jsp?=&arnumber=4786648
dc.identifier.urihttp://dspace.unimap.edu.my/123456789/7370
dc.descriptionLink to publisher's homepage at http://ieeexplore.ieee.orgen_US
dc.description.abstractSilicon nanowires (SiNWs) have their unique feature such as similar diameters to biomolecules, chemically tailorable physical properties, enable to apply in biomolecule detection and can be fabricated as a high performance field effect transistor (FET). This research describes the fabrication of silicon nanowire for DNA hybridization detection in biosensor application. The silicon nanowire with line-width of <100 nm is successfully fabricated by electron beam lithography and will follow by deposition of contact metals. Aurum is a suitable metal to make Ohmic contact with SiNWs and its exhibit electrical transport measurements of the devices. The presence of the hybridization DNA will induce electronic charge and changed the electronic properties of the transistor from which detectable electronic signals are generated.en_US
dc.language.isoenen_US
dc.publisherInstitute of Electrical and Electronics Engineering (IEEE)en_US
dc.relation.ispartofseriesInternational Conference on Electronic Design (ICED 2008)en_US
dc.subjectBiosensorsen_US
dc.subjectDNA hybridizationen_US
dc.subjectElectron beam lithographyen_US
dc.subjectNanowireen_US
dc.subjectNanofabricationen_US
dc.subjectBiomolecular electronicsen_US
dc.subjectSemiconductorsen_US
dc.titleDesign and process development of silicon nanowire based DNA biosensor using electron beam lithographyen_US
dc.typeArticleen_US
dc.contributor.urluda@unimap.edu.myen_US


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