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dc.contributor.authorAnthony Vincent, Darin Moreira
dc.contributor.authorBhuvenesh, Rajamony
dc.date.accessioned2016-11-30T06:38:04Z
dc.date.available2016-11-30T06:38:04Z
dc.date.issued2013-09
dc.identifier.citationApplied Mechanics and Materials, vol.421, 2013, pages 898-903en_US
dc.identifier.issn1662-7482
dc.identifier.uriwww.scientific.net/AMM.421.898
dc.identifier.urihttp://dspace.unimap.edu.my:80/xmlui/handle/123456789/44249
dc.descriptionLink to publisher's homepage at http://www.ttp.net/en_US
dc.description.abstractThis document explains and demonstrates the generic improvement algorithm created to enhance the maintenance methodology in the semiconductor manufacturing environment. The use of this algorithm demonstrates how a process and equipment can utilize it and get better output quality from a process and cost standpoint, which is a key driver in any manufacturing industry.en_US
dc.language.isoenen_US
dc.publisherTrans Tech Publications Ltden_US
dc.subjectCase studyen_US
dc.subjectIR laseren_US
dc.subjectLaser marken_US
dc.subjectTRIZen_US
dc.subjectMaintenance algorithmen_US
dc.subjectQuality outputen_US
dc.titleAlgorithm to improve process robustness in the assembly & test manufacturing industry a case study of the 1064nm wavelength laser mark equipmenten_US
dc.typeArticleen_US
dc.identifier.doi10.4028/www.scientific.net/AMM.421.898
dc.contributor.urldarin.moreira.anthony.vincent@intel.comen_US
dc.contributor.urlbhuvenesh@unimap.edu.myen_US


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