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Optimization of silver-assisted nano-pillar etching process in silicon
(Elsevier, 2015-12-01)
In this study, a respond surface methodology (RSM) model is developed using three-level Box-Behnken experimental design (BBD) technique. This model is developed to investigate the influence of metal-assisted chemical etching ...
Heteroepitaxial growth of vacuum-evaporated Si-Ge films on nanostructured silicon substrates
(Faculty of Science and Technology, Universiti Kebangsaan Malaysia, 2015)
In this study, a low-cost vacuum-evaporated technique is used in the heteroepitaxial growth of Si-Ge films. Three different surface variations are employed: i.e. polished Si, Si micropyramids and Si nanopillars profiles. ...