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Mask design and fabrication of Micro/Nanowire biochip for reliable and repeatability pattern transfer
(Trans Tech Publications, 2014)
In Micro/Nanowire fabrication, the alignment and exposure process are the most critical steps in photolithography process, and indeed for the whole biochip processing. This process determines the success of transferring ...
Conventional photolithography and process optimization of pattern- size expansion technique for nanogap biosensor fabrication
(Trans Tech Publications, 2014)
For a submicron photolithography process, there is little room for error. In this paper, an optimized technique for photoresist (PR) development is reported, to fabricate a nanogap biosensor for application in biomedical ...
Mask design for the reproducible fabrication and reliable pattern transfer for polysilicon nanowire
(Institute of Electrical and Electronics Engineers (IEEE), 2012)
In fabrication of Nanowire alignment and exposure are the most critical steps in photolithography process, the resolution requirements and precise alignment are vital, each mask needs to be precisely aligned with original ...
Resist uniformity evaluation through swing curve phenomena
(INSInet Publications, 2012)
In fabrication of Micro/ Nano structure, alignment and exposure are the most critical steps in photolithography process, the resolution requirements and precise alignment are vital; each mask needs to be precisely aligned ...