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Fabrication and characterization of 50 nm silicon nano-gap structures
(American Scientific Publishers, 2011-04)
A simple method for the fabrication of nano-gaps less than 50 nm by using conventional photolithography combined with patterned-size reduction techniques is presented. Silicon material is used to fabricate the nano-gap ...
Low cost detection of pH and its effect on the capacitive behavior of micro-gap sensor
(Trans Tech Publications, 2014)
The article describes the fabrication and characterization of silver microgap sensor on silicon substrate. By employing cheap photolithography process the proposed microgap sensor has been fabricated. The silver microgap ...
Conventional photolithography and process optimization of pattern- size expansion technique for nanogap biosensor fabrication
(Trans Tech Publications, 2014)
For a submicron photolithography process, there is little room for error. In this paper, an optimized technique for photoresist (PR) development is reported, to fabricate a nanogap biosensor for application in biomedical ...
Nanoelectrode chrome photomask design and specification for biosensor fabrication
(Trans Tech Publications, 2013)
This paper explains the most crucial part of any microchip fabrication, which is the mask design for photolithography process. The design is initially sketched roughly to meet the design specification and later on designed ...
Polysilicon nanogap fabrication using a thermal oxidation process
(Emerald Group Publishing Limited., 2012)
Purpose - Nanogap electrodes have important applications in power saving devices, electrochemical sensors and dielectric detections of biomolecules. The purpose of this paper is to report on the fabrication and characterization ...
Application of e-beam lithography for nanowire development
(Universiti Malaysia Perlis (UniMAP), 2010-10-16)
Miniaturization and performance improvements are driving the electronics industry to shrink the feature size of semiconductor device. Because of its diffraction limit, conventional photolithography is becoming increasingly ...
Formation of Si nanostructure using size reduction technique
(Universiti Malaysia Perlis (UniMAP), 2010-10-16)
A simple method for the fabrication of nanogaps using conventional photolithography combined with pattern-size reduction techniques is presented. Silicon material is used to fabricate the nanogap structure and gold is used ...
Mask design and fabrication of LiSFET for light sensor application
(Institute of Electrical and Electronics Engineering (IEEE), 2008-12-01)
The usage of MOSFET is not limited as amplifier and switch only but it has great potential to become the sensors when sensing mediums which integrated on to MOSFET. This research is intended to study the combination of ...
Design and fabricate Mosfet Masks at KUKUM Microfabrication Cleanroom for teaching undergraduates
(Kolej Universiti Kejuruteraan Utara Malaysia, 2005-05-18)
In teaching undergraduates program in
MOSFET fabrication, mask set is one of the major problem since the cost is extensively high. The purpose of these masks is to define certain region on a wafer. In this work, a low ...