Search
Now showing items 1-10 of 14
Cost Effective Negative Plenum Cleanroom for Microelectronic Engineering undergraduate
(Kolej Universiti Kejuruteraan Utara Malaysia, 2005)
The Negative Plenum Cleanroom which is design and built by KUKUM is primarily used for the teaching of the undergraduate microelectronic course. The cleanroom is approximately 115m² in size. The level of cleanliness in the ...
Nanowire formation for single electron transistor using SEM based Electron Beam Lithography (EBL) technique: Positive tone vs negative tone e-beam resist
(Nano Science and Technology Institute, 2006)
Experimental studies of nanowires formation are carried out by using Scanning Electron Microscope Based Electron Beam Lithography (EBL) Technique with critical dimensions in less than 100nm. In order to complete the design ...
Development of In-House MOS transistor at KUKUM Micro Fabrication Cleanroom: Microelectronic undergraduate activities
(Kolej Universiti Kejuruteraan Utara Malaysia, 2005-05-18)
This paper presents the module development of inhouse MOS transistor device at KUKUM Micro Fabrication Cleanroom. The process started with the establishment of process flow, process modules, and process parameters. Four ...
PMMA characterization and optimization for Nano Structure formation
(Kolej Universiti Kejuruteraan Utara Malaysia, 2005-05-18)
The limitations imposed on optical lithography by the wavelength of light have been overcome using electron lithography. Electron lithography offers high resolution
because of the small wavelength of the 10-50 keV electrons ...
Semiconductor Nanowire
(Kementerian Pengajian Tinggi Malaysia (KPTM), 2007-08-10)
Semiconductor Nanowire represents an important and broad class of nanometer scale wire structure. Semiconductor Nanowire is a wire of dimension of the order of a nanometer or 10-9 meters. It is the one thousand times ...
Mask Making Process (Positive and Negative Mask)
(Kementerian Pengajian Tinggi Malaysia (KPTM), 2007-08-10)
Generally, two types of masks are used in MOSFET fabrication; positive mask and negative mask. These resists mask can be used either in lift off process or conventional lithography step depends on the fabrication process ...
MOS Transistor (Fabricated Using In-House Low Cost Facilities)
(Malaysian Invention & Design Society (MINDS), 2006-05-19)
MOS Transistor is divided into two types: NMOS and PMOS. Majority carrier od NMOS is electrons whereby PMOS is holes. The MOS transistor consists of three regions namely source, drain and gate. Fabrication of MOS transistor ...
Affordable and Effective Microelectronic Engineering Teaching Package for Undergraduate Programme
(International Exhibition of Inventions, 2006-04-05)
The package, which is fully designed developed, using KUKUM in house expertise, is the first teaching laboratory that is purposely built for undergraduate microelectronic program in Malaysia.
Silicon Nanowires
(Malaysian Invention and Design Society (MINDS), 2007-05-18)
Silicon Nanowires is a new class of materials that have attracted attention and great research interest in the last few years because of their great potential applications in nanotechnology such as:
- nanoelectronic ...
Man-2403 resist development for electron beam lithography process
(Universiti Malaysia Pahang, 2009-06-20)
Line-width of resist patterns is more
susceptible to the developing time than the
thickness of the undeveloped resist. This project
focused on the development of MaN-2403 resist
for e-beam lithography process. The ...