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    • Characterization of robust alignment mark to improve alignment performance 

      Normah, Ahmad; Uda, Hashim; Mohd Jefrey, Manaf; Kader, Ibrahim (Institute of Electrical and Electronics Engineering (IEEE), 2006)
      Overlay requirement is one of the biggest obstacles in achieving a very small feature. With the continued growth of small feature size, overlay requirement becomes tighter. Such a tight requirement requires a very high ...