Now showing items 1-2 of 2

    • Mask Making Process (Positive and Negative Mask) 

      Uda, Hashim, Prof. Dr.; Nur Hamidah, Abdul Halim; Mohamad Nuzaihan, Md Nor; Zul Azhar, Zahid Jamal, Prof. Dr. (Kementerian Pengajian Tinggi Malaysia (KPTM), 2007-08-10)
      Generally, two types of masks are used in MOSFET fabrication; positive mask and negative mask. These resists mask can be used either in lift off process or conventional lithography step depends on the fabrication process ...
    • Subnanometer poly-silicon gap structure formation: Comparison study between size expansion and size reduction 

      Uda, Hashim, Prof. Dr.; Nazwa, Taib; Thikra, S. Dhahi (American Institute of Physics., 2012)
      This study describes the comparison among the three fabrication methods of an array of poly-silicon nanogap structures. The three different methods are size expansion technique (SET), size reduction technique (SRT) and ...