Browsing Uda Hashim, Prof. Ts. Dr. by Subject "E-beam lithography (EBL)"
Now showing items 1-2 of 2
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Mask Making Process (Positive and Negative Mask)
(Kementerian Pengajian Tinggi Malaysia (KPTM), 2007-08-10)Generally, two types of masks are used in MOSFET fabrication; positive mask and negative mask. These resists mask can be used either in lift off process or conventional lithography step depends on the fabrication process ... -
Subnanometer poly-silicon gap structure formation: Comparison study between size expansion and size reduction
(American Institute of Physics., 2012)This study describes the comparison among the three fabrication methods of an array of poly-silicon nanogap structures. The three different methods are size expansion technique (SET), size reduction technique (SRT) and ...