Now showing items 118-137 of 253

    • Man-2403 resist development for electron beam lithography process 

      Nur Hamidah, Abdul Halim; Uda, Hashim, Prof. Dr.; Mohammad Nuzaihan, Md Nor (Universiti Malaysia Pahang, 2009-06-20)
      Line-width of resist patterns is more susceptible to the developing time than the thickness of the undeveloped resist. This project focused on the development of MaN-2403 resist for e-beam lithography process. The ...
    • Mask design and fabrication of LiSFET for light sensor application 

      Uda, Hashim; Kasim, Abdul Rahman; Amir Razif Arief, Jamil Abdullah (Institute of Electrical and Electronics Engineering (IEEE), 2008-12-01)
      The usage of MOSFET is not limited as amplifier and switch only but it has great potential to become the sensors when sensing mediums which integrated on to MOSFET. This research is intended to study the combination of ...
    • Mask design and fabrication of Micro/Nanowire biochip for reliable and repeatability pattern transfer 

      Veeradasan, Perumal; Uda, Hashim, Prof. Dr.; Tijjani Adam, Shuwa (Trans Tech Publications, 2014)
      In Micro/Nanowire fabrication, the alignment and exposure process are the most critical steps in photolithography process, and indeed for the whole biochip processing. This process determines the success of transferring ...
    • Mask design and simulation: Computer aided design for lab-on-chip application 

      Veeradasan, Perumal; Uda, Hashim, Prof. Dr.; Tijjani Adam, Shuwa (Trans Tech Publications, 2014)
      A simple design and simulation of microwire, contact pad and microfluidic channel on computer aided design (CAD) for chrome mask fabrication are described.The integration of microfluidic and nanotechnology for miniaturized ...
    • Mask design for the reproducible fabrication and reliable pattern transfer for polysilicon nanowire 

      Tijjani Adam, Shuwa; Uda, Hashim, Prof. Dr.; Leow, Pei Ling (Institute of Electrical and Electronics Engineers (IEEE), 2012)
      In fabrication of Nanowire alignment and exposure are the most critical steps in photolithography process, the resolution requirements and precise alignment are vital, each mask needs to be precisely aligned with original ...
    • Mask design platform for zinc oxide nanowire growth 

      Rajintra Prasat, Haarindra Prasat; Uda, Hashim, Prof. Dr.; Tijjani Adam, Shuwa (Trans Tech Publications, 2013)
      This paper mainly represent the simple and effective method to design the chrome mask for patterning the platform for zinc oxide nanowire growth. The most essential aspect that need to be considered in designing the chrome ...
    • Mask Making Process (Positive and Negative Mask) 

      Uda, Hashim, Prof. Dr.; Nur Hamidah, Abdul Halim; Mohamad Nuzaihan, Md Nor; Zul Azhar, Zahid Jamal, Prof. Dr. (Kementerian Pengajian Tinggi Malaysia (KPTM), 2007-08-10)
      Generally, two types of masks are used in MOSFET fabrication; positive mask and negative mask. These resists mask can be used either in lift off process or conventional lithography step depends on the fabrication process ...
    • Mercaptopropyltriethoxysilane (MPTES) Concentration Effect on Selectivity and Electrical Response of Nanostructure 

      Ammar B., Mosbah; Tijjani, Adam; Mohammed, Mohammed; Omar S., Dahham; Uda, Hashim; Nik Noriman, Zulkepli (IOP Publishing, 2018)
      The surface modification by on Mercaptopropyltriethoxysilane (MPTES) done to enhance electrical behavior of nano-IDE -based sensor, silicon based active area was coated with MPTES. The electrical properties of modified ...
    • Micro/nanoscale biosensing in microfluidics: Selection of polymers and microstructures 

      Tijjani Adam, Shuwa; Uda, Hashim, Prof. Dr.; Leow, Pei Ling; Md Eaqub, Ali (AENSI Publications, 2012-01)
      Microfluidic techniques based on nanotechnology for miniaturized lab-on-chip systems have recently received huge research attention because of its undisputable and widespread biomedical applications. For the development ...
    • Microfluidic photomask design using CAD software for application in lab-on-chip biomedical nano diagnostics 

      Balakrishnan, Sharma Rao; Uda, Hashim, Prof. Dr. (Trans Tech Publications, 2013)
      Photomasks are used as stencil to print images on semiconductor material. This study represents design and specifications of photomask for microfluidic fabrication. For a precise pattern transfer, the photomask should meet ...
    • Microfluidics design and fabrication for life sciences application 

      Tijjani Adam, Shuwa; Uda, Hashim, Prof. Dr.; Foo, Kai Loong (American Scientific Publishers, 2013-01)
      This paper introduces a simple design and fabrication for microfluidics that need no external pumping power to delivery fluid into sensing domain with minimum sample available. Analysis using COMSOL 3.5 Multiphysics ...
    • Micropump pattern replication using Printed Circuit Board (PCB) technology 

      Pei, Song Chee; Rashidah @ Siti Saedah, Arsat, Dr.; Uda, Hashim, Prof. Dr.; Ruzairi, Abdul Rahim, Prof. Dr.; Loew, Pei Ling, Dr. (Taylor and Francis Group, LLC., 2013-06-01)
      This article shows a low-cost rapid hot embossing poly (methylmeth acrylate) (PMMA)-based micropump replication with printed circuit board (PCB) mold. PCB material offers advantages of low cost, rigid, and rapid thermal ...
    • Microstructure and polymer choice in microfluidic interfacing for nanoscale biosensing 

      Tijjani Adam, Shuwa; Uda, Hashim, Prof. Dr.; Mohd Faizul, Bari, Dr.; Pei, Ling Leow (Institute of Electrical and Electronics Engineers (IEEE), 2012-02-27)
      Miniaturization of Biosensors based on nanotechnology are rapidly developing with gaining of undisputable ground and are becoming widespread in the biomedical with capability of improving the existing current diagnosis ...
    • Modelling Simulation of Organic and Inorganic Interaction Based on First Principle Calculation 

      Tijjani, Adam; Aeshah M., Mohammed; Mohammed, Mohammed; Omar S., Dahham; Uda, Hashim; Nik Noriman, Zulkepli (IOP Publishing, 2018)
      The student presented theoretically interaction of organic and inorganic based on the electrostatic interaction created by the ssDNA interaction with sensor active surface, the ssDNA strand was immobilised on silicon-based ...
    • Modular architecture of a non-contact pinch actuation micropump 

      Chee, Pei Song; Rashidah, Arsat. Dr.; Tijjani Adam, Shuwa; Uda, Hashim, Prof. Dr.; Ruzairi, Abdul Rahim, Prof. Dr.; Leow, Pei Ling (MDPI, Basel, Switzerland., 2012-09)
      This paper demonstrates a modular architecture of a non-contact actuation micropump setup. Rapid hot embossing prototyping was employed in micropump fabrication by using printed circuit board (PCB) as a mold material in ...
    • Morphological, optical, and Raman characteristics of ZnO nanoflakes prepared via a sol-gel method 

      Mohammad, Kashif; Syed Muhammad, Usman Ali; Mohamed A, Mohd Ali; Abdulgafour, H. I.; Uda, Hashim, Prof. Dr.; Willander, Magnus; Zainuriah, Hassan (WILEY-VCH Verlag GmbH & Co., 2012-01)
      Two-dimensional (2D) ZnO nanoflakes were grown on thin aluminum layer, deposited on silicon substrate, using a sol-gel method. The surface morphologies of ZnO nanoflakes at different precursor concentrations were studied ...
    • Morphological, structural, and gas-sensing characterization of tin-doped indium oxide nanoparticles 

      Ayeshamariam, A.; Muhammad, Kashif; Bououdina, M.; Uda, Hashim, Prof. Dr.; Jayachandran, M.; Md. Eaqub, Ali (Elsevier, 2014-01)
      Tin-doped indium oxide (ITO) nanoparticles with stable cubic phases were synthesized using a sol–gel combustion method that includes gelation and combustion in organic fuel. The influence of SnO₂ on the phase and morphology ...
    • MOS Transistor (Fabricated Using In-House Low Cost Facilities) 

      Uda, Hashim, Prof. Dr.; Zul Azhar, Zahid Jamal, Prof. Dr.; Nur Hamidah, Abdul Halim; Mohammadd Nuzaihan, Mohd Nor; Mohd Sallehudin, Saad; Phang, Keng Chew; Haffiz, Abd Razak; Bahari, Man (Malaysian Invention & Design Society (MINDS), 2006-05-19)
      MOS Transistor is divided into two types: NMOS and PMOS. Majority carrier od NMOS is electrons whereby PMOS is holes. The MOS transistor consists of three regions namely source, drain and gate. Fabrication of MOS transistor ...
    • MOS Transistor Mask Design Using SEM Based E-Beam Lithography 

      Uda, Hashim, Prof. Dr.; Nur Hamidah, Abdul Halim; Mohammad Nuzaihan, Md Nor; Zul Azhar, Zahid Jamal, Prof. Dr. (Malaysian Invention & Design Society (MINDS), 2006-05-19)
      Electron beam lithography (EBL) is one of the alternative tools in transferring micro and nano circuit patterns from design editor to the substrate. EBL is state-of-the-art technology for micro and even to nano feature ...
    • MOSFET Technology for Microelectronic Engineering Undergraduate Programme 

      Zul Azhar, Zahid Jamal, Prof. Dr.; Uda, Hashim, Prof. Dr.; Nur Hamidah, Abdul Halim; Mohammad Nuzaihan, Md Nor (Kementerian Pengajian Tinggi Malaysia (KPTM), 2005-09-30)
      This project focused on the process development of MOSFET fabrication. Microelectronic fabrication equipment and facilities from the micro fabrication cleanroom laboratory in KUKUM were used for the purposes of this project. ...