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Subnanometer poly-silicon gap structure formation: Comparison study between size expansion and size reduction
(American Institute of Physics., 2012)
This study describes the comparison among the three fabrication methods of an array of poly-silicon nanogap structures. The three different methods are size expansion technique (SET), size reduction technique (SRT) and ...
Mask Making Process (Positive and Negative Mask)
(Kementerian Pengajian Tinggi Malaysia (KPTM), 2007-08-10)
Generally, two types of masks are used in MOSFET fabrication; positive mask and negative mask. These resists mask can be used either in lift off process or conventional lithography step depends on the fabrication process ...