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Study of aspect ratio performance on Silicon Oxide wet etching by using Profilometer, AFM and SEM
(Universiti Malaysia Perlis, 2008-03)
A study of aspect ratio performance on silicon oxide is developing to predict the
oxide profile on surface of wafer. The main focus of this project is to perform and
produce a high profile of silicon oxide under profiler ...
Study of the effect of different Gases parameter in Dry Etching process on Etch Rate profile
(Universiti Malaysia Perlis, 2008-04)
The principal focus of this project is dry etching technique by using the Inductively
Couple Plasma-Reactive Ion Etching (ICP-RIE). An (ICP) system was chosen because of
its high plasma density and low cost relative to ...