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Coherent effect on LOCOS and STI technique for 0.18 µm CMOS technology using Taurus Workbench
(Universiti Malaysia Perlis, 2008-04)
LOCOS (Local Oxidation of Silicon) and STI (Shallow Trench Isolation) are two isolation techniques used in integrated circuit fabrication. Further device scaling using
LOCOS technique is no longer practical for technology ...