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Now showing items 11-20 of 41
Simulation of Ion Implantation using Monte Carlo Method for Investigation on Ion Trajectories
(Universiti Malaysia Perlis, 2007-04)
The goal of simulating the ion implantation is to predict the distribution of implanted ions in the target and also to predict the amount of damage generated in the target. During ion implantation process, accelerated ions ...
Study on diffusivity of Gallium dopant in Silicon using Spin On Dopant (SOD) technique
(Universiti Malaysia Perlis, 2008-03)
Diffusion and ion implantation are two major processes by which chemical species or dopant are introduced into a semiconductor such as silicon to form the electronic
structure. The diffusion process is a method to control ...
Analysis & design low power multiplier using TSMC 0.18µm CMOS technology
(Universiti Malaysia Perlis, 2008-04)
As the advance of VLSI technology, low power design has become an important topic in
VLSI design. This project is to design a low power multiplier implemented in mentor
graphic tools. Low power multipliers are developed ...
Analysis the role of supply voltage and load capacitor in small-signal MOSFET amplifiers
(Universiti Malaysia Perlis, 2008-03)
The main objective of this project is to investigate the role of supply voltage and load capacitance in the performance of small-signal MOS amplifier with the PSpice simulation for the Common Source, Common Gate and Common ...
Design and Simulation of CMOS Operational Amplifier using Mentor Graphics Tool
(Universiti Malaysia Perlis, 2007-04)
Today’s atmosphere and demands continue to drive operating voltages down, especially for widely used components such as the Operational Amplifier. Some of the motivations driving the market are integration, battery operated ...
Coherent effect on LOCOS and STI technique for 0.18 µm CMOS technology using Taurus Workbench
(Universiti Malaysia Perlis, 2008-04)
LOCOS (Local Oxidation of Silicon) and STI (Shallow Trench Isolation) are two isolation techniques used in integrated circuit fabrication. Further device scaling using
LOCOS technique is no longer practical for technology ...
Design a current mirror using body driven technique
(Universiti Malaysia Perlis, 2008-04)
Current mirror or current source is a one of the key elements in analog circuit design. For high performance analog circuit applications, the accuracy and output impedance are the most important parameters to determine the ...
Design and analysis of Floating Point multiplier
(Universiti Malaysia Perlis, 2008-04)
The most important floating-point representation is defined in IEEE Standard 754, adopted in 1985. This standard was developed to facilitate the portability of programs from one processor to another and to encourage the ...
Study of the effect of different Gases parameter in Dry Etching process on Etch Rate profile
(Universiti Malaysia Perlis, 2008-04)
The principal focus of this project is dry etching technique by using the Inductively
Couple Plasma-Reactive Ion Etching (ICP-RIE). An (ICP) system was chosen because of
its high plasma density and low cost relative to ...
Optimization of 950K PMMA resists for Nano-application using Statistical Design Expert
(Universiti Malaysia Perlis, 2008-05)
This paper discusses the application of a design of experiments (DOE) experimental method for analyzing the influence of four parameters (coating time, spinning speed, and softbake time and softbake temperature).involved ...