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Please use this identifier to cite or link to this item: http://dspace.unimap.edu.my:80/xmlui/handle/123456789/9017
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dc.contributor.authorJ., Podder-
dc.contributor.authorT., Hossain-
dc.date.accessioned2010-08-23T07:19:30Z-
dc.date.available2010-08-23T07:19:30Z-
dc.date.issued2010-06-09-
dc.identifier.citationp.46-50en_US
dc.identifier.isbn978-967-5760-02-0-
dc.identifier.urihttp://dspace.unimap.edu.my/123456789/9017-
dc.descriptionInternational Conference on X-Rays and Related Techniques in Research and Industry (ICXRI 2010) jointly organized by Universiti Malaysia Perlis (UniMAP) and X-Ray Application Malaysia Society (XAPP), 9th - 10th June 2010 at Aseania Resort Langkawi, Malaysia.en_US
dc.description.abstractIn this study, spray pyrolysis method has been employed for the deposition of some transparent oxide thin films like ZnO, CdO and SnO2 onto glass substrate under atmospheric pressure using zinc acetate, cadmium acetate and tin chloride precursors at relatively low temperature around 200~350°C. Films of various thicknesses have been obtained by varying the deposition time and concentrations, while all other deposition parameters such as spray rate, carrier gas pressure and distance between spray nozzle to substrate were kept constant. Surface morphology, structural and optical properties of the as-deposited thin films has been studied by Scanning Electron Microscopy (SEM) attached with an EDX, XRD and UV visible spectroscopyen_US
dc.language.isoenen_US
dc.publisherUniversiti Malaysia Perlisen_US
dc.relation.ispartofseriesProceedings of the International Conference on X-Rays & Related Techniques in Research & Industry (ICXRI) 2010en_US
dc.subjectTransparent conducting oxide filmsen_US
dc.subjectSpray pyrolysisen_US
dc.subjectXRDen_US
dc.subjectEDXen_US
dc.subjectSEM and UV-visible spectroscopyen_US
dc.subjectBang gapen_US
dc.subjectInternational Conference on X-Rays & Related Techniques in Research & Industry (ICXRI)en_US
dc.titleDeposition of some transparent conducting oxide thin films by a simple spray pyrolysis technique and their characterizations for optoelectronic applicationsen_US
dc.typeArticleen_US
dc.publisher.departmentSchool of Materials Engineering & School of Environmental Engineeringen_US
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