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DC Field | Value | Language |
---|---|---|
dc.contributor.author | Nur Hamidah, Abdul Halim | - |
dc.contributor.author | Uda, Hashim, Prof. Dr. | - |
dc.contributor.author | Mohammad Nuzaihan, Md Nor | - |
dc.date.accessioned | 2010-08-13T04:50:02Z | - |
dc.date.available | 2010-08-13T04:50:02Z | - |
dc.date.issued | 2009-06-20 | - |
dc.identifier.uri | http://dspace.unimap.edu.my/123456789/8646 | - |
dc.description | Malaysian Technical Universities Conference on Engineering and Technology organized by Universiti Malaysia Pahang in collaboration with Universiti Tun Hussein Onn Malaysia, Universiti Teknikal Malaysia Melaka & Universiti Malaysia Perlis on June 20th - 22nd, 2009, at MS Garden Hotel, Kuantan, Pahang, Malaysia. | en_US |
dc.description.abstract | Line-width of resist patterns is more susceptible to the developing time than the thickness of the undeveloped resist. This project focused on the development of MaN-2403 resist for e-beam lithography process. The objective of this project is to observe the effect of exposure dose and development time to the physical structure of maN-2403 resist using scanning electron microscope (SEM) and atomic force microscopy (AFM). The incomplete development of exposed resist pattern caused bridging effect in ma-N2403 resist tone. | en_US |
dc.language.iso | en | en_US |
dc.publisher | Universiti Malaysia Pahang | en_US |
dc.relation.ispartofseries | Proceedings of the Malaysian Technical Universities Conference on Engineering and Technology (MUCEET) 2009 | en_US |
dc.subject | E-beam lithography | en_US |
dc.subject | Resist development | en_US |
dc.subject | maN-2403 | en_US |
dc.subject | Malaysian Technical Universities Conference on Engineering and Technology (MUCEET) | en_US |
dc.title | Man-2403 resist development for electron beam lithography process | en_US |
dc.type | Working Paper | en_US |
Appears in Collections: | Conference Papers Uda Hashim, Prof. Ts. Dr. Mohammad Nuzaihan Md Nor, Associate Professor Dr. |
Files in This Item:
File | Description | Size | Format | |
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158-160.pdf | Access is limited to UniMAP community | 684.25 kB | Adobe PDF | View/Open |
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