UniMAP Library Digital Repository JSPUI
UniMAP Library Digital Repository preserves and enables easy and open access to all types of digital content including text, images, moving images, mpegs and data sets
Learn More
Please use this identifier to cite or link to this item:
http://dspace.unimap.edu.my:80/xmlui/handle/123456789/8646Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Nur Hamidah, Abdul Halim | - |
| dc.contributor.author | Uda, Hashim, Prof. Dr. | - |
| dc.contributor.author | Mohammad Nuzaihan, Md Nor | - |
| dc.date.accessioned | 2010-08-13T04:50:02Z | - |
| dc.date.available | 2010-08-13T04:50:02Z | - |
| dc.date.issued | 2009-06-20 | - |
| dc.identifier.uri | http://dspace.unimap.edu.my/123456789/8646 | - |
| dc.description | Malaysian Technical Universities Conference on Engineering and Technology organized by Universiti Malaysia Pahang in collaboration with Universiti Tun Hussein Onn Malaysia, Universiti Teknikal Malaysia Melaka & Universiti Malaysia Perlis on June 20th - 22nd, 2009, at MS Garden Hotel, Kuantan, Pahang, Malaysia. | en_US |
| dc.description.abstract | Line-width of resist patterns is more susceptible to the developing time than the thickness of the undeveloped resist. This project focused on the development of MaN-2403 resist for e-beam lithography process. The objective of this project is to observe the effect of exposure dose and development time to the physical structure of maN-2403 resist using scanning electron microscope (SEM) and atomic force microscopy (AFM). The incomplete development of exposed resist pattern caused bridging effect in ma-N2403 resist tone. | en_US |
| dc.language.iso | en | en_US |
| dc.publisher | Universiti Malaysia Pahang | en_US |
| dc.relation.ispartofseries | Proceedings of the Malaysian Technical Universities Conference on Engineering and Technology (MUCEET) 2009 | en_US |
| dc.subject | E-beam lithography | en_US |
| dc.subject | Resist development | en_US |
| dc.subject | maN-2403 | en_US |
| dc.subject | Malaysian Technical Universities Conference on Engineering and Technology (MUCEET) | en_US |
| dc.title | Man-2403 resist development for electron beam lithography process | en_US |
| dc.type | Working Paper | en_US |
| Appears in Collections: | Conference Papers Uda Hashim, Prof. Ts. Dr. Mohammad Nuzaihan Md Nor, Associate Professor Dr. | |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| 158-160.pdf | Access is limited to UniMAP community | 684.25 kB | Adobe PDF | View/Open |
Items in UniMAP Library Digital Repository are protected by copyright, with all rights reserved, unless otherwise indicated.