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dc.contributor.authorUda, Hashim, Prof. Dr.-
dc.contributor.authorNur Hamidah, Abdul Halim-
dc.contributor.authorMohammad Nuzaihan, Md Nor-
dc.contributor.authorZul Azhar, Zahid Jamal, Prof. Dr.-
dc.date.accessioned2010-07-20T04:51:51Z-
dc.date.available2010-07-20T04:51:51Z-
dc.date.issued2006-05-19-
dc.identifier.urihttp://dspace.unimap.edu.my/123456789/8345-
dc.descriptionProf. Dr. Uda Hashim and his team won silver for MOS Transistor Mask Design Using SEM Based E-Beam Lithography at ITEX 2006, 19th - 21st May 2006 at Kuala Lumpur Convention Centre (KLCC), Kuala Lumpur.en_US
dc.description.abstractElectron beam lithography (EBL) is one of the alternative tools in transferring micro and nano circuit patterns from design editor to the substrate. EBL is state-of-the-art technology for micro and even to nano feature size in direct writing technology. SEM based EBL will be used to define the mask for device fabrication. These masks were designed in GDSII Editor in EBL System. Poly-methyl-metacrylate (PMMA) is used as a resist in the EBL.en_US
dc.language.isoenen_US
dc.publisherMalaysian Invention & Design Society (MINDS)en_US
dc.relation.ispartofseries17th International Invention, Innovation & Technology Exhibition 2006 (ITEX 2006)en_US
dc.subjectE-Beam Lithography (EBL)en_US
dc.subjectMOS Transistor Mask Designen_US
dc.subjectKUKUM -- Researchen_US
dc.subjectInternational Invention, Innovation & Technology Exhibitionen_US
dc.subjectITEX 2006en_US
dc.titleMOS Transistor Mask Design Using SEM Based E-Beam Lithographyen_US
dc.typeImageen_US
dc.contributor.urluda@kukum.edu.myen_US
Appears in Collections:Zul Azhar Zahid Jamal, Dato' Prof. Dr.
Universiti Malaysia Perlis
Uda Hashim, Prof. Ts. Dr.

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