Influence of Ar gas on optical and morphology properties of films (CdS) prepared by pulse laser deposition (PLD) technique

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Title:	Influence of Ar gas on optical and morphology properties of films (CdS) prepared by pulse laser deposition (PLD) technique
Authors:	Mustansiriyah University, College of Education, Department of Physics, Baghdad, Iraq yasmeen_zadan@yahoo.com.
Issue Date:	Jan-2022
Publisher:	Universiti Malaysia Perlis (UniMAP)
Citation:	International Journal of Nanoelectronics and Materials, vol.15(1), 2022, pages 9-16
Abstract:	Cadmium sulfide thin films, formed by pulse laser deposition method, resulted in CdS thin films deposited on glass substrate with different Ar gas (5, 10 and 15) torr. Structural (X-ray) diffraction, morphological (atomic force microscope) and optical (transmittance and absorption) spectra of CdS films have been investigated. The high value of transmittance determined from optical transmittance spectra was 72%. Direct band gap energy of prepared films are (2.54, 2.16 and 2.72) eV with different pressure of Ar gas. X-ray diffraction synthesis proved CdS films in crystalline with hexagonal structure. By using Scherrerś equation, average grain size about 80nm was determined. AFM image shown the morphology of formation films and the effect of gas pressure on nanostructure.
Description:	Link to publisher's homepage at http://ijneam.unimap.edu.my
URI:	http://dspace.unimap.edu.my:80/xmlui/handle/123456789/76352
ISSN:	1985-5761 (Printed) 2232-1535 (online)
Appears in Collections:	International Journal of Nanoelectronics and Materials (IJNeaM)

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