Development of In-House MOS transistor at KUKUM Micro Fabrication Cleanroom: Microelectronic undergraduate activities

Abstract

This paper presents the module development of inhouse MOS transistor device at KUKUM Micro Fabrication Cleanroom. The process started with the establishment of process flow, process modules, and process parameters. Four modules were developed and characterized prior to MOS transistor device fabrication namely dry and wet oxidation and etching, resist thickness and exposure dose optimization, n-type and p-type spin on dopant and diffusion also metal thickness characterization. The data were analyzed and applied in the fabrication of MOS transistor devices. Standard CMOS process was utilized in this experiment. The results for all the processes are present in this paper.