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dc.contributor.authorBalakrishnan, Sharma Rao-
dc.contributor.authorUda, Hashim, Prof. Dr.-
dc.date.accessioned2014-06-16T05:01:58Z-
dc.date.available2014-06-16T05:01:58Z-
dc.date.issued2013-
dc.identifier.citationAdvanced Materials Research, vol. 795, 2013, pages 388-392en_US
dc.identifier.isbn978-303785811-0-
dc.identifier.issn1022-6680-
dc.identifier.urihttp://www.scientific.net/AMR.795.388-
dc.identifier.urihttp://dspace.unimap.edu.my:80/dspace/handle/123456789/35567-
dc.descriptionLink to publisher's homepage at http://www.ttp.net/en_US
dc.description.abstractPhotomasks are used as stencil to print images on semiconductor material. This study represents design and specifications of photomask for microfluidic fabrication. For a precise pattern transfer, the photomask should meet with certain considerations such as critical dimension uniformity, resolution and alignment. This paper explains the design of microfluidics with three channels using AutoCAD software for lab-on-chip application. Total surface area of the device is 242.52mm2 in which the width and length is 12.00mm and 20.21mm respectively. The device was designed in particular size to meet its behavior as a disposable chip and increases the economic value when it is fabricated.en_US
dc.language.isoenen_US
dc.publisherTrans Tech Publicationsen_US
dc.subjectAutoCADen_US
dc.subjectBiomedicalen_US
dc.subjectCritical dimensionen_US
dc.subjectLab-on-chipen_US
dc.subjectMicrofluidicen_US
dc.subjectNano diagnosticen_US
dc.subjectPhotomasken_US
dc.titleMicrofluidic photomask design using CAD software for application in lab-on-chip biomedical nano diagnosticsen_US
dc.typeArticleen_US
dc.contributor.urlbala.sharmarao@gmail.comen_US
dc.contributor.urluda@unimap.edu.myen_US
Appears in Collections:Institute of Nano Electronic Engineering (INEE) (Articles)
Uda Hashim, Prof. Ts. Dr.

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