Effect of additives on optical measurements of NiSe2 thin films

Abstract

Nickel selenide, NiSe2 is one of the absorbent materials used in thin film technology in photoelectrochemical (PEC) cell. Electrodeposition is a preferred method to produce NiSe2 thin films due to its advantages such as the possibility of large scale production, minimum waste of components, easy monitoring of deposition process and large area deposition. Ethylenediaminetetraacetic acid (EDTA) and triethanolamine (TEA) were employed as the additives during the deposition. The samples were deposited within 30 minutes deposition time according to potential acquired from cyclic voltammetry measurements. Thin film thickness measurements, structural studies, optical studies, morphological and compositional analysis as well as Mott-Schottky measurements were carried out.