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dc.contributor.authorDhahi, T.S-
dc.contributor.authorUda, Hashim, Prof. Dr.-
dc.contributor.authorMd. Eaqub, Ali-
dc.contributor.authorNazwa, Taib-
dc.date.accessioned2013-06-10T07:46:16Z-
dc.date.available2013-06-10T07:46:16Z-
dc.date.issued2012-
dc.identifier.citationMicroelectronics International, vol. 29 (1), 2012, pages 40-46en_US
dc.identifier.issn1356-5362-
dc.identifier.urihttp://www.emeraldinsight.com/journals.htm?articleid=17020779&show=abstract-
dc.identifier.urihttp://dspace.unimap.edu.my/123456789/25642-
dc.descriptionLink to publisher's homepage at http://www.emeraldinsight.com/en_US
dc.description.abstractPurpose - Nanogap electrodes have important applications in power saving devices, electrochemical sensors and dielectric detections of biomolecules. The purpose of this paper is to report on the fabrication and characterization of polysilicon nanogap patterning using novelties technique. Design/methodology/ approach - Polysilicon material is used to fabricate the nanogap structure and gold is used for the electrode and two chrome masks are used to complete this work; the first mask for the nanogap pattern and a second mask for the electrode. The method is based on the control of the coefficients (temperature and time) with an improved pattern size resolution thermal oxidation. Findings - Physical characterization by scanning electron microscopy (SEM) demonstrates such nanogap electrodes could be produced with high reproducibility and precision. Electrical characterization shows that nanogap enhanced the sensitivity of the device by increase the capacitance and the conductivity as well. They have also good efficiency of power consumption with high insulation properties. Originality/value - With this technique, there are no principal limitations to fabricating nanostructures with different layouts down to several different nanometer dimensions. The paper documents the fabrication of nanogaps electrodes on a polysilicon, using low-cost techniques such as vacuum deposition and conventional lithography. Polysilicon is a low-cost materials and has desirable properties for semiconductor applications. A method of preparing a nanogap electrode according to the present innovation has an advantage of providing active surface that can easily be modified for immobilizations of biomolecules.en_US
dc.language.isoenen_US
dc.publisherEmerald Group Publishing Limited.en_US
dc.subjectCapacitanceen_US
dc.subjectElectrodesen_US
dc.subjectMicroelectronicsen_US
dc.subjectNanogapen_US
dc.subjectNanotechnologyen_US
dc.subjectPhotolithographyen_US
dc.subjectPhysical characterizationen_US
dc.subjectSize reductionen_US
dc.titlePolysilicon nanogap fabrication using a thermal oxidation processen_US
dc.typeArticleen_US
dc.contributor.urlsthikra@yahoo.comen_US
Appears in Collections:Institute of Nano Electronic Engineering (INEE) (Articles)
Uda Hashim, Prof. Ts. Dr.

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