Please use this identifier to cite or link to this item: http://dspace.unimap.edu.my:80/xmlui/handle/123456789/1973
Title: Analysis of the deposited carbon during Electron Beam Induced Deposition (EBID) in Scanning Electron Microscope using Secondary Ion Mass Spectrometry (SIMS)
Authors: Nur Liana Kamal
Shaiful Nizam Mohyar (Advisor)
Keywords: Electron beams
Scanning electron microscopes
Silicon
Nanostructures
Semiconductors
Integrated circuits
Issue Date: Mar-2008
Publisher: Universiti Malaysia Perlis
Abstract: Many experiments on the mechanics of nanostructures require the creation of rigid clamps at specific locations. In this work, electron beam induced deposition (EBID) has been used to deposit carbon films that are similar to those that have recently been used for clamping nanostructures. The film deposition rate was accelerated by placing a paraffin source of hydrocarbon near the area where the EBID deposits were made. High-resolution transmission electron microscopy, electron-energy-loss spectroscopy, Raman spectroscopy, secondary-ionmass spectrometry, and nanoindentation were used to characterize the chemical composition and the mechanics of the carbonaceous deposits.
URI: http://dspace.unimap.edu.my/123456789/1973
Appears in Collections:School of Microelectronic Engineering (FYP)

Files in This Item:
File Description SizeFormat 
Abstract, Acknowledgment.pdf29.69 kBAdobe PDFView/Open
Conclusion.pdf21.86 kBAdobe PDFView/Open
Introduction.pdf23.57 kBAdobe PDFView/Open
Literature review.pdf104.22 kBAdobe PDFView/Open
Methodology.pdf48.28 kBAdobe PDFView/Open
References and appendix.pdf252.96 kBAdobe PDFView/Open
Results and discussion.pdf880.97 kBAdobe PDFView/Open


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