| dc.contributor.author | Uda, Hashim, Prof. Dr. | |
| dc.contributor.author | Nur Hamidah, Abdul Halim | |
| dc.contributor.author | Mohamad Nuzaihan, Md Nor | |
| dc.contributor.author | Zul Azhar, Zahid Jamal, Prof. Dr. | |
| dc.date.accessioned | 2010-06-22T08:24:24Z | |
| dc.date.available | 2010-06-22T08:24:24Z | |
| dc.date.issued | 2007-08-10 | |
| dc.identifier.uri | http://dspace.unimap.edu.my/123456789/8172 | |
| dc.description | PECIPTA 2007 dianjurkan oleh Kementerian Pengajian Tinggi Malaysia (KPTM) dengan kerjasama Universiti Sains Malaysia (USM) pada 10 - 12 Ogos 2007 di Pusat Konvensyen Kuala Lumpur (KLCC), Kuala Lumpur. | en_US |
| dc.description.abstract | Generally, two types of masks are used in MOSFET fabrication; positive mask and negative mask. These resists mask can be used either in lift off process or conventional lithography step depends on the fabrication process requirement. To achieve good resolution, Scanning Electron Microscopy (SEM) based E-beam lithography (EBL) was used to transfer the patern according the design. The patern was design in GDSII Editor in EBL System. Positive resist, Poly-methly-metacrylate (PMMA) and Negative resist, maN2403 were used as a resist in the EBL. | en_US |
| dc.language.iso | en | en_US |
| dc.publisher | Kementerian Pengajian Tinggi Malaysia (KPTM) | en_US |
| dc.relation.ispartofseries | PECIPTA 2007 | en_US |
| dc.subject | Mask | en_US |
| dc.subject | E-beam lithography (EBL) | en_US |
| dc.subject | EBL System | en_US |
| dc.subject | UniMAP -- Research and development | en_US |
| dc.subject | UniMAP -- Exhibition | en_US |
| dc.subject | PECIPTA 2007 | en_US |
| dc.title | Mask Making Process (Positive and Negative Mask) | en_US |
| dc.type | Image | en_US |
| dc.contributor.url | uda@unimap.edu.my | en_US |
