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dc.contributor.authorNaser M., Ahmed
dc.contributor.authorZaliman, Sauli
dc.contributor.authorUda, Hashim
dc.contributor.authorYarub, Al-Douri
dc.date.accessioned2009-09-03T02:28:41Z
dc.date.available2009-09-03T02:28:41Z
dc.date.issued2009
dc.identifier.citationInternational Journal of Nanoelectronics and Materials, vol.2 (2), 2009, pages 189-195.en_US
dc.identifier.issn1985-5761 (Printed)
dc.identifier.issn1997-4434 (Online)
dc.identifier.urihttp://dspace.unimap.edu.my/123456789/7123
dc.descriptionLink to publisher's homepage at http://www.unimap.edu.my/ ; Open access only applicable for vol. 1; issue 1, 2008 & vol. 2; issue 1 & 2, 2009.en_US
dc.description.abstractThe design of optoelectronic devices fabricated from III-Nitride materials is aided by knowledge of refractive index and absorption coefficient of these materials .The optical properties of Al0.11Ga0.89N, Al0.03Ga0.97N, and GaN grown by MOVPE on sapphire were investigated by means of transmittance measurements .The optical transmission method is successfully used to determine the refractive index (n), absorption coefficient (α), film thickness and energy gap of three samples of film over the spectral range of (1-5 eV) .en_US
dc.language.isoenen_US
dc.publisherUniversiti Malaysia Perlisen_US
dc.subjectAbsorption coefficientsen_US
dc.subjectRefractive indexen_US
dc.subjectOptical propertiesen_US
dc.subjectIII-Nitride energy band gapen_US
dc.subjectOptoelectronic devicesen_US
dc.subjectOptoelectronic devices -- Design and constructionen_US
dc.subjectOptoelectronics -- Materialsen_US
dc.titleInvestigation of the absorption coefficient, refractive index, energy band gap, and film thickness for Al0.11Ga0.89N, Al0.03Ga0.97N, and GaN by optical transmission methoden_US
dc.typeArticleen_US


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