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Pattern designed for combination of optical lithography and electron beam lithography
(Universiti Malaysia Pahang, 2009-06-20)
In this paper the fabricated pattern of
nanometer and micrometer structures created with
electron beam lithography (EBL) and optical
lithography on silicon on insulator (SOI) material
is presented. The resist used to ...
Man-2403 resist development for electron beam lithography process
(Universiti Malaysia Pahang, 2009-06-20)
Line-width of resist patterns is more
susceptible to the developing time than the
thickness of the undeveloped resist. This project
focused on the development of MaN-2403 resist
for e-beam lithography process. The ...
Nanowire formation using electron beam lithography
(American Institute of Physics, 2009-06-01)
Miniaturization and performance improvements are driving the electronics industry to shrink the feature size of semiconductor device. Because of its diffraction limit, conventional photolithography is becoming increasingly ...