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    PMMA characterization and optimization for Nano Structure formation 

    S Niza, Mohammad Bajuri; Nur Hamidah, Abdul Halim; Mohammad Nuzaihan, Md Nor; Uda, Hashim (Kolej Universiti Kejuruteraan Utara Malaysia, 2005-05-18)
    The limitations imposed on optical lithography by the wavelength of light have been overcome using electron lithography. Electron lithography offers high resolution because of the small wavelength of the 10-50 keV electrons ...

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    AuthorMohammad Nuzaihan, Md Nor (1)
    Nur Hamidah, Abdul Halim (1)
    S Niza, Mohammad Bajuri (1)
    Uda, Hashim (1)
    SubjectBeam energy (1)Electron beam lithography (1)Lithography, Electron beam (1)Nano structure (1)Polymethyl-Methacrylate (PMMA) (1)... View MoreDate Issued2005 (1)

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