Search
Now showing items 1-3 of 3
The alignment of single SWNTs between electrode using dielectrophoresis
(Universiti Malaysia Perlis (UniMAP), 2012-06-18)
This paper presents the development and fabrication of electrical devices based on alignment of carbon nanotubes (CNTs) in single bundle of single-walled carbon nanotubes (sb-SWNTs) using dielectrophoresis (DEP). The Silicon ...
PMMA characterization and optimization for Nano Structure formation
(Kolej Universiti Kejuruteraan Utara Malaysia, 2005-05-18)
The limitations imposed on optical lithography by the wavelength of light have been overcome using electron lithography. Electron lithography offers high resolution
because of the small wavelength of the 10-50 keV electrons ...
Man-2403 resist development for electron beam lithography process
(Universiti Malaysia Pahang, 2009-06-20)
Line-width of resist patterns is more
susceptible to the developing time than the
thickness of the undeveloped resist. This project
focused on the development of MaN-2403 resist
for e-beam lithography process. The ...