Now showing items 1-2 of 2
Application of e-beam lithography for nanowire development
(Universiti Malaysia Perlis (UniMAP), 2010-10-16)
Miniaturization and performance improvements are driving the electronics industry to shrink the feature size of semiconductor device. Because of its diffraction limit, conventional photolithography is becoming increasingly ...
Pattern designed for combination of optical lithography and electron beam lithography
(Universiti Malaysia Pahang, 2009-06-20)
In this paper the fabricated pattern of nanometer and micrometer structures created with electron beam lithography (EBL) and optical lithography on silicon on insulator (SOI) material is presented. The resist used to ...