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    Application of e-beam lithography for nanowire development 

    S. Fatimah, Abd Rahman; Uda, Hashim, Prof. Dr.; Mohammad Nuzaihan, Md Nor (Universiti Malaysia Perlis (UniMAP), 2010-10-16)
    Miniaturization and performance improvements are driving the electronics industry to shrink the feature size of semiconductor device. Because of its diffraction limit, conventional photolithography is becoming increasingly ...
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    Pattern designed for combination of optical lithography and electron beam lithography 

    S. Fatimah, Abd Rahman; Uda, Hashim, Prof. Dr.; Mohammad Nuzaihan, Md Nor; A. M., Mohamed Nuri; Muhamad Emi Azri, Shohini (Universiti Malaysia Pahang, 2009-06-20)
    In this paper the fabricated pattern of nanometer and micrometer structures created with electron beam lithography (EBL) and optical lithography on silicon on insulator (SOI) material is presented. The resist used to ...

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    AuthorMohammad Nuzaihan, Md Nor (2)
    S. Fatimah, Abd Rahman (2)
    Uda, Hashim, Prof. Dr. (2)A. M., Mohamed Nuri (1)Muhamad Emi Azri, Shohini (1)SubjectElectron beam lithography (EBL) (1)Electron beam lithogrphy (1)Malaysian Technical Universities Conference on Engineering and Technology (MUCEET) (1)Nanowire (1)Nanowires (1)... View MoreDate Issued2010 (1)2009 (1)

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