Browsing Mohammad Nuzaihan Md Nor, Associate Professor Dr. by Subject "Malaysian Technical Universities Conference on Engineering and Technology (MUCEET)"
Now showing items 1-2 of 2
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Man-2403 resist development for electron beam lithography process
(Universiti Malaysia Pahang, 2009-06-20)Line-width of resist patterns is more susceptible to the developing time than the thickness of the undeveloped resist. This project focused on the development of MaN-2403 resist for e-beam lithography process. The ... -
Pattern designed for combination of optical lithography and electron beam lithography
(Universiti Malaysia Pahang, 2009-06-20)In this paper the fabricated pattern of nanometer and micrometer structures created with electron beam lithography (EBL) and optical lithography on silicon on insulator (SOI) material is presented. The resist used to ...