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    • Application of e-beam lithography for nanowire development 

      S. Fatimah, Abd Rahman; Uda, Hashim, Prof. Dr.; Mohammad Nuzaihan, Md Nor (Universiti Malaysia Perlis (UniMAP)Centre for Graduate Studies, 2010-10-16)
      Miniaturization and performance improvements are driving the electronics industry to shrink the feature size of semiconductor device. Because of its diffraction limit, conventional photolithography is becoming increasingly ...