Browsing Mohammad Nuzaihan Md Nor, Associate Professor Dr. by Subject "Electron beam lithography"

Now showing items 1-5 of 5

    • Design and fabrication of silicon nanowire based sensor 

      Siti Fatimah, Abd Rahman; Nor Azah, Yusof, Prof. Dr.; Uda, Hashim, Prof. Dr.; Mohammad Nuzaihan, Md Nor (Electrochemical Science Group (ESG), 2013)
      This paper reports the process development of silicon nanowires sensor requires both the fabrication of nanoscale diameter wires and standard integration to CMOS process. By using silicon-on-insulator (SOI) wafer as a ...

    • Design and process development of silicon nanowire based DNA biosensor using electron beam lithography 

      Uda, Hashim; Siti Fatimah, Abd Rahman; Mohammad Nuzaihan, Md Nor; Shahrir, Salleh (Institute of Electrical and Electronics Engineering (IEEE), 2008-12-01)
      Silicon nanowires (SiNWs) have their unique feature such as similar diameters to biomolecules, chemically tailorable physical properties, enable to apply in biomolecule detection and can be fabricated as a high performance ...

    • Nanowire formation using electron beam lithography 

      Rahman, S. F. A.; Uda, Hashim, Prof. Dr.; Mohammad Nuzaihan, Md Nor; Mohamed Nuri, A. M.; Mohamad Emi Azri, Shohini; Salleh, S. (American Institute of Physics, 2009-06-01)
      Miniaturization and performance improvements are driving the electronics industry to shrink the feature size of semiconductor device. Because of its diffraction limit, conventional photolithography is becoming increasingly ...

    • Negative Pattern Scheme (NPS) design for nanowire formation using scanning electron microscope based electron beam lithography technique 

      Mohammad Nuzaihan, Md Nor; Uda, Hashim, Prof. Dr.; Siti Fatimah, Abdul Rahman; Tijjani Adam, Shuwa (Trans Tech Publications, 2014)
      In this work, we report the used of Negative Pattern Scheme (NPS) by Electron Microscope Based Electron Beam Lithography (EBL) Technique in connection with scanning electron microscope (SEM) for creating extremely fine ...

    • PMMA characterization and optimization for Nano Structure formation 

      S Niza, Mohammad Bajuri; Nur Hamidah, Abdul Halim; Mohammad Nuzaihan, Md Nor; Uda, Hashim (Kolej Universiti Kejuruteraan Utara Malaysia, 2005-05-18)
      The limitations imposed on optical lithography by the wavelength of light have been overcome using electron lithography. Electron lithography offers high resolution because of the small wavelength of the 10-50 keV electrons ...