Browsing Mohammad Nuzaihan Md Nor, Associate Professor Dr. by Title

Now showing items 8-12 of 12

    • Man-2403 resist development for electron beam lithography process 

      Nur Hamidah, Abdul Halim; Uda, Hashim, Prof. Dr.; Mohammad Nuzaihan, Md Nor (Universiti Malaysia Pahang, 2009-06-20)
      Line-width of resist patterns is more susceptible to the developing time than the thickness of the undeveloped resist. This project focused on the development of MaN-2403 resist for e-beam lithography process. The ...

    • Nanowire formation using electron beam lithography 

      Rahman, S. F. A.; Uda, Hashim, Prof. Dr.; Mohammad Nuzaihan, Md Nor; Mohamed Nuri, A. M.; Mohamad Emi Azri, Shohini; Salleh, S. (American Institute of Physics, 2009-06-01)
      Miniaturization and performance improvements are driving the electronics industry to shrink the feature size of semiconductor device. Because of its diffraction limit, conventional photolithography is becoming increasingly ...

    • Negative Pattern Scheme (NPS) design for nanowire formation using scanning electron microscope based electron beam lithography technique 

      Mohammad Nuzaihan, Md Nor; Uda, Hashim, Prof. Dr.; Siti Fatimah, Abdul Rahman; Tijjani Adam, Shuwa (Trans Tech Publications, 2014)
      In this work, we report the used of Negative Pattern Scheme (NPS) by Electron Microscope Based Electron Beam Lithography (EBL) Technique in connection with scanning electron microscope (SEM) for creating extremely fine ...

    • Pattern designed for combination of optical lithography and electron beam lithography 

      S. Fatimah, Abd Rahman; Uda, Hashim, Prof. Dr.; Mohammad Nuzaihan, Md Nor; A. M., Mohamed Nuri; Muhamad Emi Azri, Shohini (Universiti Malaysia Pahang, 2009-06-20)
      In this paper the fabricated pattern of nanometer and micrometer structures created with electron beam lithography (EBL) and optical lithography on silicon on insulator (SOI) material is presented. The resist used to ...

    • PMMA characterization and optimization for Nano Structure formation 

      S Niza, Mohammad Bajuri; Nur Hamidah, Abdul Halim; Mohammad Nuzaihan, Md Nor; Uda, Hashim (Kolej Universiti Kejuruteraan Utara Malaysia, 2005-05-18)
      The limitations imposed on optical lithography by the wavelength of light have been overcome using electron lithography. Electron lithography offers high resolution because of the small wavelength of the 10-50 keV electrons ...