Now showing items 1-2 of 2
Effect of substrate bias in copper sputtering plasma measured by Langmuir Probe
(Trans Tech Publications Inc., 2014-04)
There are several techniques to deposit the metal oxide thin film such as electron beam evaporator, pulse laser deposition and reactive magnetron sputtering deposition. In this experiment, magnetron sputtering deposition ...
Influence of dissipation power in copper sputtering plasma measured by optical emission spectroscopy
(Trans Tech Publications, 2014)
Copper oxide is a low cost material, easy process fabrication and sensitivity to ambient conditions. Therefore, it is a suitable p-type semiconductor oxides material to be used as a gas sensing material. In order to raise ...