Browsing Uda Hashim, Prof. Ts. Dr. by Subject "maN-2403"
Now showing items 1-1 of 1
-
Man-2403 resist development for electron beam lithography process
(Universiti Malaysia Pahang, 2009-06-20)Line-width of resist patterns is more susceptible to the developing time than the thickness of the undeveloped resist. This project focused on the development of MaN-2403 resist for e-beam lithography process. The ...