Now showing items 1-9 of 9

    • Application of e-beam lithography for nanowire development 

      S. Fatimah, Abd Rahman; Uda, Hashim, Prof. Dr.; Mohammad Nuzaihan, Md Nor (Universiti Malaysia Perlis (UniMAP)Centre for Graduate Studies, 2010-10-16)
      Miniaturization and performance improvements are driving the electronics industry to shrink the feature size of semiconductor device. Because of its diffraction limit, conventional photolithography is becoming increasingly ...
    • Conventional photolithography and process optimization of pattern- size expansion technique for nanogap biosensor fabrication 

      Balakrishnan, Sharma Rao; Muhammad Nurfaiz, Asri; Uda, Hashim, Prof. Dr.; Tijjani Adam, Shuwa (Trans Tech Publications, 2014)
      For a submicron photolithography process, there is little room for error. In this paper, an optimized technique for photoresist (PR) development is reported, to fabricate a nanogap biosensor for application in biomedical ...
    • Design and fabricate Mosfet Masks at KUKUM Microfabrication Cleanroom for teaching undergraduates 

      Mohd Zainizan, Sahdan; Uda, Hashim; Hashim, Saim; Marlia, Morsin (Kolej Universiti Kejuruteraan Utara Malaysia, 2005-05-18)
      In teaching undergraduates program in MOSFET fabrication, mask set is one of the major problem since the cost is extensively high. The purpose of these masks is to define certain region on a wafer. In this work, a low ...
    • Fabrication and characterization of 50 nm silicon nano-gap structures 

      T.S, Dhahi; Uda, Hashim, Prof. Dr.; N.M., Ahmed (American Scientific Publishers, 2011-04)
      A simple method for the fabrication of nano-gaps less than 50 nm by using conventional photolithography combined with patterned-size reduction techniques is presented. Silicon material is used to fabricate the nano-gap ...
    • Formation of Si nanostructure using size reduction technique 

      Th., Shikra Dhahi; Uda, Hashim, Prof. Dr.; N. M., Ahmed (Universiti Malaysia Perlis (UniMAP)Centre for Graduate Studies, 2010-10-16)
      A simple method for the fabrication of nanogaps using conventional photolithography combined with pattern-size reduction techniques is presented. Silicon material is used to fabricate the nanogap structure and gold is used ...
    • Low cost detection of pH and its effect on the capacitive behavior of micro-gap sensor 

      Qazi Muhammad, Humayun; Uda, Hashim, Prof. Dr.; Tijjani Adam, Shuwa (Trans Tech Publications, 2014)
      The article describes the fabrication and characterization of silver microgap sensor on silicon substrate. By employing cheap photolithography process the proposed microgap sensor has been fabricated. The silver microgap ...
    • Mask design and fabrication of LiSFET for light sensor application 

      Uda, Hashim; Kasim, Abdul Rahman; Amir Razif Arief, Jamil Abdullah (Institute of Electrical and Electronics Engineering (IEEE), 2008-12-01)
      The usage of MOSFET is not limited as amplifier and switch only but it has great potential to become the sensors when sensing mediums which integrated on to MOSFET. This research is intended to study the combination of ...
    • Nanoelectrode chrome photomask design and specification for biosensor fabrication 

      Balakrishnan, Sharma Rao; Uda, Hashim, Prof. Dr. (Trans Tech Publications, 2013)
      This paper explains the most crucial part of any microchip fabrication, which is the mask design for photolithography process. The design is initially sketched roughly to meet the design specification and later on designed ...
    • Polysilicon nanogap fabrication using a thermal oxidation process 

      Dhahi, T.S; Uda, Hashim, Prof. Dr.; Md. Eaqub, Ali; Nazwa, Taib (Emerald Group Publishing Limited., 2012)
      Purpose - Nanogap electrodes have important applications in power saving devices, electrochemical sensors and dielectric detections of biomolecules. The purpose of this paper is to report on the fabrication and characterization ...