Now showing items 1-2 of 2

    • Characterization of robust alignment mark to improve alignment performance 

      Normah, Ahmad; Uda, Hashim; Mohd Jefrey, Manaf; Kader, Ibrahim (Institute of Electrical and Electronics Engineering (IEEE), 2006)
      Overlay requirement is one of the biggest obstacles in achieving a very small feature. With the continued growth of small feature size, overlay requirement becomes tighter. Such a tight requirement requires a very high ...
    • Mask design for the reproducible fabrication and reliable pattern transfer for polysilicon nanowire 

      Tijjani Adam, Shuwa; Uda, Hashim, Prof. Dr.; Leow, Pei Ling (Institute of Electrical and Electronics Engineers (IEEE), 2012)
      In fabrication of Nanowire alignment and exposure are the most critical steps in photolithography process, the resolution requirements and precise alignment are vital, each mask needs to be precisely aligned with original ...