Search
Now showing items 1-2 of 2
Mask design platform for zinc oxide nanowire growth
(Trans Tech Publications, 2013)
This paper mainly represent the simple and effective method to design the chrome mask for patterning the platform for zinc oxide nanowire growth. The most essential aspect that need to be considered in designing the chrome ...
Mask design for the reproducible fabrication and reliable pattern transfer for polysilicon nanowire
(Institute of Electrical and Electronics Engineers (IEEE), 2012)
In fabrication of Nanowire alignment and exposure are the most critical steps in photolithography process, the resolution requirements and precise alignment are vital, each mask needs to be precisely aligned with original ...