|
iRepository at Perpustakaan UniMAP >
VICE CHANCELLOR'S OFFICE >
University Events and Activities >
Please use this identifier to cite or link to this item:
http://hdl.handle.net/123456789/9099
|
| Title: | Electron beam lithography solutions concept |
| Authors: | Anon |
| Keywords: | Electron beam lithogrphy
Lithography technique
E-beam nanolithography
UniMAP -- Activities
UniMAP -- Institut Kejuruteraan Nano Elektronik |
| Issue Date: | 11-May-2010 |
| Publisher: | Universiti Malaysia Perlis (UniMAP) |
| Department: | Institute of Nano Electronic Engineering |
| Series/Report no.: | 1-Day Intensive Nanolithography Workshop Asia |
| Description: | Dianjurkan oleh Institut Kejuruteraan Nano Elektronik dan Raith Asia Ltd. pada 11 Mei 2010 di Dewan Kuliah DKP1, Pusat Kejuruteraan Kuala Perlis, Universiti Malaysia Perlis. |
| URI: | http://hdl.handle.net/123456789/9099 |
| Appears in Collections: | University Events and Activities
|
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.
|
