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Please use this identifier to cite or link to this item: http://dspace.unimap.edu.my:80/dspace/handle/123456789/8821

Title: Pattern designed for combination of optical lithography and electron beam lithography
Authors: S. Fatimah, Abd Rahman
Uda, Hashim, Prof. Dr.
Mohammad Nuzaihan, Md Nor
A. M., Mohamed Nuri
Muhamad Emi Azri, Shohini
Keywords: Electron beam lithogrphy;Optical lithography;Nanowire;Silicon on insulator (SOI);Malaysian Technical Universities Conference on Engineering and Technology (MUCEET)
Issue Date: 20-Jun-2009
Publisher: Universiti Malaysia Pahang
Citation: p.1-4
Series/Report no.: Proceedings of the Malaysian Technical Universities Conference on Engineering and Technology (MUCEET) 2009
Abstract: In this paper the fabricated pattern of nanometer and micrometer structures created with electron beam lithography (EBL) and optical lithography on silicon on insulator (SOI) material is presented. The resist used to demonstrate this EBL pattern creation is ma-N 2403 which is a negative tone photoresist series, while positive resist is used for transform mask design using optical lithography. Three different patterns structures are fabricated on the sample namely alignment mark, silicon nanowire and metal pad. Silicon nanowire is designed using GDS II Editor Software and exposed using SEM based EBL system while alignment mark and metal pad are designed using AutoCAD and exposed using conventional photolithography process. The fabricated structures are observed using high power microscope and SEM imaging.
Description: Malaysian Technical Universities Conference on Engineering and Technology organized by Universiti Malaysia Pahang in collaboration with Universiti Tun Hussein Onn Malaysia, Universiti Teknikal Malaysia Melaka & Universiti Malaysia Perlis on June 20th - 22nd, 2009, at MS Garden Hotel, Kuantan, Pahang, Malaysia.
URI: http://hdl.handle.net/123456789/8821
Appears in Collections:Conference Papers
Uda Hashim, Prof. Dr.

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