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Please use this identifier to cite or link to this item: http://dspace.unimap.edu.my:80/dspace/handle/123456789/8795

Title: CdS film thickness characterization by R.F. magnetron sputtering
Authors: Uda, Hashim, Prof. Dr.
Kasim, Abdul Rahman
Hakim
Mohd Azri, Othman
Keywords: Cadmium sulphide (CdS);Resistivity;RF magnetron sputtering;X-ray diffraction;Malaysian Technical Universities Conference on Engineering and Technology (MUCEET)
Issue Date: 1-Jun-2009
Publisher: American Institute of Physics
Citation: Vol.1136, 2009, p. 253-258
Series/Report no.: Proceedings of the International Conference on Nanoscience and Nanotechnology 2008
Abstract: In this work, cadmium sulphide (CdS) target with 99.999% purity was used as a target in RF magnetron sputtering. The sputtering experiment was conducted onto silicon oxide substrates at different temperatures ranging from 200°C to 400°C in 50°C steps, using a capacitive coupled magnetron cathode with 13.65 MHz that at higher magnetron power. After all investigations, it was concluded that 300°C substrate temperature is suitable for producing CdS films on silicon wafer with RF magnetron sputtering and the examined properties (good crystallinity and low resistivity) of this film show its feasibility for technological purposes, especially for light sensor cells.
Description: Link to publisher's homepage at http://www.aip.org/
URI: http://link.aip.org/link/?APCPCS/1136/253/1
http://hdl.handle.net/123456789/8795
ISSN: 0094-243X
Appears in Collections:Conference Papers
Uda Hashim, Prof. Dr.

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