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Please use this identifier to cite or link to this item:
http://hdl.handle.net/123456789/8646
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| Title: | Man-2403 resist development for electron beam lithography process |
| Authors: | Nur Hamidah, Abdul Halim
Uda, Hashim, Prof. Dr.
Mohammad Nuzaihan, Md Nor |
| Keywords: | E-beam lithography
Resist development
maN-2403
Malaysian Technical Universities Conference on Engineering and Technology (MUCEET) |
| Issue Date: | 20-Jun-2009 |
| Publisher: | Universiti Malaysia Pahang |
| Series/Report no.: | Proceedings of the Malaysian Technical Universities Conference on Engineering and Technology (MUCEET) 2009 |
| Abstract: | Line-width of resist patterns is more
susceptible to the developing time than the
thickness of the undeveloped resist. This project
focused on the development of MaN-2403 resist
for e-beam lithography process. The objective of
this project is to observe the effect of exposure
dose and development time to the physical
structure of maN-2403 resist using scanning
electron microscope (SEM) and atomic force
microscopy (AFM). The incomplete development
of exposed resist pattern caused bridging effect in
ma-N2403 resist tone. |
| Description: | Malaysian Technical Universities Conference on Engineering and Technology organized by Universiti Malaysia Pahang in collaboration with Universiti Tun Hussein Onn Malaysia, Universiti Teknikal Malaysia Melaka & Universiti Malaysia Perlis on
June 20th - 22nd, 2009, at MS Garden Hotel, Kuantan, Pahang, Malaysia. |
| URI: | http://hdl.handle.net/123456789/8646 |
| Appears in Collections: | Uda Hashim, Prof. Dr.
Conference Papers
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Files in This Item:
| File |
Description |
Size | Format |
|---|
| 158-160.pdf | Access is limited to UniMAP community | 684.25 kB | Adobe PDF | View/Open |
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