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|Title: ||Theoretical and experimental study towards fabrication of nanogap dielectric biosensor by reversed spacer lithography|
|Authors: ||Uda, Hashim, Prof. Dr.|
Muhamad Emi Azri, Shohini
|Keywords: ||DNA hybridization;Lab-on-a-chip;Nanogap;Reverse spacer lithographic;Spacer patterning technology;International Conference on Advancement of Materials and Nanotechnology 2007;ICAMN 2007|
|Issue Date: ||11-Mar-2010|
|Publisher: ||American Institute of Physics|
|Citation: ||AIP Conference Proceedings, vol.1217 (1), 2010, pages 505-509|
|Series/Report no.: ||Proceedings of International Conference on Advancement of Materials and Nanotechnology (ICAMN) 2007|
|Abstract: ||A reversed spacer patterning technology using a sacrificial layer and a chemical vapor deposition (CVD) spacer layer has been developed, and is demonstrated to achieve sub-50 nm structures with conventional dry etching. The minimum-sized features are defined not by the photolithography but by the CVD film thickness. Therefore, this technology yields critical dimension (CD) variations of minimum-sized features much smaller than that achieved by conventional optical or e-beam lithography and has a great potential to fabricate a nanosystems for the electrical detection of biomolecular interactions.|
|Description: ||International Conference on Advancement of Materials and Nanotechnology (ICAMN) 2007, 29th May - 1st June 2007 was held at Pulau Langkawi, Kedah, Malaysia.
Link to publisher's homepage at http://proceedings.aip.org/|
|Appears in Collections:||Conference Papers|
Uda Hashim, Prof. Dr.
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