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Please use this identifier to cite or link to this item: http://dspace.unimap.edu.my:80/dspace/handle/123456789/7366

Title: Mask design and fabrication of LiSFET for light sensor application
Authors: Uda, Hashim
Kasim, Abdul Rahman
Amir Razif Arief Jamil, Abdullah
???metadata.dc.contributor.url???: uda@unimap.edu.my
Keywords: Amplifiers;Field effect transistor switches;Photolithography;Nonelectric sensing devices;Integrated circuit fabrication;Light sensor MOSFET
Issue Date: 1-Dec-2008
Publisher: Institute of Electrical and Electronics Engineering (IEEE)
Citation: p.1-5
Series/Report no.: Proceedings of the International Conference on Electronic Design (ICED 2008)
Abstract: The usage of MOSFET is not limited as amplifier and switch only but it has great potential to become the sensors when sensing mediums which integrated on to MOSFET. This research is intended to study the combination of MOSFET and photoconductive material to perform as a single device Light Sensor MOSFET (LiSFET) using standard lithography process. Photolithography (also called optical lithography) has long been used to transfer circuit patterns from a template called photomask (or simply mask) on to silicon wafers during integrated circuit (IC) fabrication. When a light source is used to project the mask image onto the wafer, the image quality is often affected by the performance of the imaging system (also called exposure system).
Description: Link to publisher's homepage at http://ieeexplore.ieee.org
URI: http://ieeexplore.ieee.org/search/wrapper.jsp?arnumber=4786651
http://hdl.handle.net/123456789/7366
ISBN: 978-1-4244-2315-6
Appears in Collections:Conference Papers
Uda Hashim, Prof. Dr.

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