DSpace
 

iRepository at Perpustakaan UniMAP >
Final Year Project Papers & Reports >
School of Microelectronic Engineering (FYP) >

Please use this identifier to cite or link to this item: http://dspace.unimap.edu.my:80/dspace/handle/123456789/2342

Title: The study of the effect of MOS transistor scaling on the critical device parameters
Authors: Zazurina Abd Rahman
???metadata.dc.contributor.advisor???: Ramzan Mat Ayub (Advisor)
Keywords: MOS transistor;Integrated circuits;Semiconductors;Metal oxide semiconductors;Metal oxide semiconductors -- Mathematical models;Transistors;Metal oxide semiconductor field-effect transistors
Issue Date: Apr-2007
Publisher: Universiti Malaysia Perlis
???metadata.dc.publisher.department???: School of Microelectronic Engineering
Abstract: Since the invention of transistors some 30 years ago, CMOS devices have been scale down aggressively in each technology generations to achieve higher integration density and performance. The device shrinkage allow denser circuits, more functions per floor space, more complicated and integrated design, higher speed, lower supply voltage, which revolutionized the information and communication (ICT) technology. This report presents an investigation into the study of the effect of MOS transistor scaling on the critical device parameters. The parameters understudy are threshold voltage, on and off state leakage current, and short channel effect on sub-threshold characteristics, that have a direct influence on the integrated circuit (ICs) performance. An initial research found that, among the process parameters involved in the manufacture of devices, gate length has the most influential effect on those parameters. This study showed, for the MOSFET with gate length below one-tenths of a micrometer, has an operational problems. The study also proved that, producing MOSFET with channel lengths much smaller than a micrometer is a challenge, and the difficulties of semiconductor device fabrication are always a limiting factor in advancing integrated circuit technology.
URI: http://hdl.handle.net/123456789/2342
Appears in Collections:School of Microelectronic Engineering (FYP)

Files in This Item:

File Description SizeFormat
Abstract, Acknowledgment.pdf171.6 kBAdobe PDFView/Open
Conclusion.pdf73.54 kBAdobe PDFView/Open
Introduction.pdf87.06 kBAdobe PDFView/Open
Literature review.pdf535.93 kBAdobe PDFView/Open
Methodology.pdf630.37 kBAdobe PDFView/Open
References and appendix.pdf432.2 kBAdobe PDFView/Open
Results and discussion.pdf978.76 kBAdobe PDFView/Open
View Statistics

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

 

Valid XHTML 1.0! Perpustakaan Tuanku syed Faizuddin Putra, Kampus Pauh Putra, Universiti Malaysia Perlis, 02600, Arau Perlis
TEL: +604-9885420 | FAX: +604-9885405 | EMAIL: rujukan@unimap.edu.my Feedback