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Please use this identifier to cite or link to this item: http://dspace.unimap.edu.my:80/xmlui/handle/123456789/21498

Title: Formation of Si nanostructure using size reduction technique
Authors: Th., Shikra Dhahi
Uda, Hashim, Prof. Dr.
N. M., Ahmed
???metadata.dc.contributor.url???: sthikra@yahoo.com
Keywords: Si–SiO2 substrate;Photolithography;Scanning electron microscope (SEM)
Issue Date: 16-Oct-2010
Publisher: Universiti Malaysia Perlis (UniMAP)
???metadata.dc.publisher.department???: Centre for Graduate Studies
Series/Report no.: Proceedings of the International Postgraduate Conference on Engineering (IPCE 2010)
Abstract: A simple method for the fabrication of nanogaps using conventional photolithography combined with pattern-size reduction techniques is presented. Silicon material is used to fabricate the nanogap structure and gold is used for the electrode. Two chrome masks are proposed to complete this work, the first mask for the nanogap pattern and a second mask for the electrode. With this technique, there are no principal limitations to fabricating nanostructures with different layouts down to several different nanometer dimensions. In this work, the proposed method is experimentally demonstrated by preparing the nanogaps on a Si–SiO2 substrate. The optical characterization that is applied to check the nanogap structure is by using the scanning electron microscope (SEM).
Description: International Postgraduate Conference On Engineering (IPCE 2010), 16th - 17th October 2010 organized by Centre for Graduate Studies, Universiti Malaysia Perlis (UniMAP) at School of Mechatronic Engineering, Pauh Putra Campus, Perlis, Malaysia.
URI: http://hdl.handle.net/123456789/21498
ISBN: 978-967-5760-03-7
Appears in Collections:Conference Papers
Uda Hashim, Prof. Dr.

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