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    • The effect of pulse DC and DC substrate bias during in situ cleaning PVD process on surface roughness 

      Hanizam, Hashim; Mohd Saufhwee, Abd Rahman; Anuar, A.R, K.; Md. Nizam, Abd. Rahman, Dr.; Noraiham, Mohamad, Dr. (Malaysian Technical Universities Network (MTUN), 2012-11-20)
      Surface morphology modification during in situ cleaning of physical vapor deposition (PVD) process is essential to strengthen and prevent unexpected adhesion failure during machining. Applying pulse direct current (PDC) ...