Browsing by Subject "Semiconductors -- Etching"
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Study of aspect ratio performance on Silicon Oxide wet etching by using Profilometer, AFM and SEM
(Universiti Malaysia PerlisSchool of Microelectronic Engineering, 2008-03)A study of aspect ratio performance on silicon oxide is developing to predict the oxide profile on surface of wafer. The main focus of this project is to perform and produce a high profile of silicon oxide under profiler ... -
Study of the effect of different Gases parameter in Dry Etching process on Etch Rate profile
(Universiti Malaysia PerlisSchool of Microelectronic Engineering, 2008-04)The principal focus of this project is dry etching technique by using the Inductively Couple Plasma-Reactive Ion Etching (ICP-RIE). An (ICP) system was chosen because of its high plasma density and low cost relative to ...