Browsing by Subject "E-beam lithography"
Now showing items 1-3 of 3
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Man-2403 resist development for electron beam lithography process
(Universiti Malaysia Pahang, 2009-06-20)Line-width of resist patterns is more susceptible to the developing time than the thickness of the undeveloped resist. This project focused on the development of MaN-2403 resist for e-beam lithography process. The ... -
Ohmic contacts optimisation for High-Power InGaAs/AlAs double-barrier resonant tunnelling diodes based on a dual-exposure e-beam lithography approach
(Universiti Malaysia Perlis (UniMAP), 2021-12)In this paper, we report on a simple test structure which can be used to accurately extract the specific contact resistivity ρc associated with metal-n++ InGaAs-based low-resistance Ohmic contacts through the transfer ... -
Silicon nanowire sensor by mix and match lithography process: Fabrication and characterization
(American Institute of Physics, 2012-06-06)Silicon nanowires (SiNWs) have attracted significant interest in the study because of their potential to impact applications from nanoscale electronics to biomedical engineering. E-Beam Lithography couple with standard ...